Author: N. Bonasso, P. Pigeat

Institute: Laboratory of Surface Science and Engineering, UMR CNRS 7570, School of Mines, Parc Sorup, Nancy, 54042, France, Laboratory of Physics of Ionized Media and their Applications, UMR CNRS, Faculty of Science, UHP NANCY I, BP 239, Vendoeuvre-les-Nancy, 54046, France

This study describes the process of producing ultra-thin films of icosahedral Al-Cu-Fe alloy with an open surface. For each of the three components, three independent evaporation guns were used, which were operated under ultra-high vacuum conditions. The traditional method of sequential deposition followed by annealing leads to significant roughness of the films (100 nm), which complicates the study of their physicochemical and optical characteristics. The study demonstrates that by simultaneously depositing the three elements, it is possible to obtain homogeneous quasi-crystalline deposits with a roughness ten times smaller than with sequential deposition.

In recent years, the study of ultra-thin quasicrystalline films of Al-Cu-Fe systems has attracted increasing attention due to their unique properties and potential applications in various fields of science and technology. Obtaining such films without protective coatings using the molecular beam epitaxy (MBE) method is a significant challenge, since it requires careful control over growth and processing conditions.

The influence of processing on the properties of the resulting films is a key point in their study. By changing the substrate temperature, sputtering rate and post-growth annealing conditions, various changes in the morphology and crystalline structure of the films can be observed. Specific processing parameters can lead to improvements in the strength, thermal stability and electrical characteristics of quasi-crystalline formations.

Thus, further study of Al-Cu-Fe film processing techniques will open new horizons for their use in microelectronics and materials science, and will also help to better understand the fundamental properties of quasi-crystalline systems.

Quasi-crystalline metal alloys attract attention due to their unique properties, such as low thermal conductivity, conductivity and high corrosion resistance. Due to their brittleness, they are more appropriately used as coatings for structural materials to impart these characteristics or used in microelectronics, optics and other applications. The AlCuFe alloy, chosen for its cost-effectiveness, has an icosahedral structure, requiring high accuracy in composition. Methods such as plasma spraying and magnetron sputtering are not universal for concentration control.

Our study utilized the ultra-high vacuum physical vapor deposition (PVD) method with three independent evaporation chambers. Sequential deposition requires additional heating to achieve “quasicrystallization,” which often results in excessive roughness. We considered two processes: the classic Method A with sequential deposition and a new Method B in which the three components were condensed simultaneously. We compare both processes to show how they lead to different types of quasicrystalline deposits.

We use cookies in order to give you the best possible experience on our website. By continuing to use this site, you agree to our use of cookies.
Accept