In modern materials science, special attention is paid to the development and study of complex multicomponent coatings with unique physical and chemical properties. Among the promising materials, alloys based on aluminum, copper and iron, alloyed with boron (AlCuFe(B)) stand out, which demonstrate high hardness, wear resistance and corrosion resistance. The process of physical vapor deposition (PVD) is one of the most effective methods for synthesizing such coatings. To optimize the parameters of the PVD process and control the quality of the resulting coatings, it is necessary to use plasma diagnostic methods, such as optical emission spectroscopy (OES).
In this paper, the process of PVD synthesis of AlCuFe(B) coatings is studied using the OES method. The experiments were carried out in a vacuum chamber using a magnetron sputtering system. AlCuFe and boron alloys were used as targets. The plasma emission spectra were recorded using a spectrometer installed in the immediate vicinity of the target. Analysis of the spectral lines allowed us to determine the concentrations of various plasma components (Al, Cu, Fe, B) and estimate the electron temperature.
Optical emission spectroscopy is used to analyze the composition of thin films produced by aluminum sputtering. The formation of complex Al–Cu metallic phases is investigated by direct current magnetron sputtering of individual targets followed by low-temperature heat treatment.
The possibility of growing all stable low-temperature phases of the Al–Cu system by the indicated method is demonstrated. An assumption is made about using some of these phases as an intermediate layer to improve the adhesion of quasi-crystalline AlCuFe coatings to the metal base.
Next, Cu25Fe12 and Al59.5Cu25.3Fe12.2B3 targets are introduced into the work. It is expected that this approach will optimize the synthesis of complex phases of metal alloys, which are of interest to industry as new materials for coatings.
The obtained results showed that the intensity of the spectral lines of the target elements depends on the power supplied to the magnetron. An increase in power leads to an increase in the target sputtering rate and, as a consequence, to an increase in the concentration of elements in the plasma. In addition, the introduction of boron into the target affects the spectral characteristics of the plasma, changing the electron temperature and the concentration of other elements.
The OES method is an effective tool for studying the process of PVD synthesis of complex AlCuFe(B) coatings. The obtained data allow optimizing the process parameters and controlling the composition of the resulting coatings, which contributes to the creation of materials with specified properties.
Author: T. Duguet, V. Fournée, J. M. Dubois, T. Belmonte
Institute: Jean Lamour Institute, Department of Physics and Chemistry of Solids and Surfaces, University of Nancy, CNRS, Parc Sorupt, CS 14234, F-54042 Nancy, France